Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403

공학

한국표면공학회지 (36권2호 122-127)

Characterization of Nanocomposite Ti-Si-N Films Prepared by a Hybrid Deposition System of A If and Sputtering Techniques

하이브리드 증착 시스템을 이용한 나노복합체 Ti-Si-N 박막의 특성 연구

윤순영;최성룡;이미혜;김광호;

부산대학교 공과대학 재료공학부;기술신용보증기금 기술평가센터;

Abstract

Ti - Si - N hard films were deposited on SKD11 steel substrates by a hybrid deposition system, where TiN was deposited by AIP method while Si was incorporated by sputtering one. The microstructure of Ti-Si-N films was revealed to be a composite of TiN crystallites and amorphous Si3N4 by instrumental analyses. The highest hardness value of about 45 Gpa was obtained at the Si content of around 7.7 at.%. With increase of Si content, the size of TiN crystallites was reduced and their distribution was changed from aligned to randomly orientated states. Surface roughness of Ti-Si-N film also decreased with increase of Si content.

Keywords

Ti-Si-N;Hybrid deposition system;Superhardness;