한국표면공학회지 (36권1호 34-41)
Effect of Additives and Plating Conditions on Sn-Pb Alloy Film of Semiconductor Formed by High Speed Electroplating
전해도금에 의해 형성된 반도체 금속도금용 주석-납 합금피막의 첨가제 및 전해조건의 영향
정강효;김병관;박상언;김만;장도연;
창원대학교 화공시스템공학과;한국기계연구원 표면연구부;
Effects of additives and plating conditions of high speed electroplating were investigated. The Sn content in electrodeposit was highly decreased with increasing current density from
Stannic oxide;Tetravalent tin;Gallic acid;Carbon content;