한국표면공학회지 (33권1호 34-37)
C-axis Orientation of ZnO Thin Films Prepared by DC Facing Targets Sputtering Method
직류 대향타겟스퍼터링법으로 제작된 ZnO 박막의 c-축 배향성
금민종;손인환;공석현;성하윤;김경환;
경원대학교 공대 전기전자공학부;신성대학 전기과;
We prepared ZnO thin film with Facing Targets Sputtering system that can deposit thin film in plasma-free situation and change the deposition condition in wide range. And prepared thin film`s c-axis orientation and grain size were analyzed by XRD (x-ray diffractometer). In the results, we suggest that FTS system is very suitable to preparing high quality ZnO thin film with good c-axis orientation.
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