한국표면공학회지 (32권3호 244-248)
PHOTOELECTRODEPOSITION OF COPPER ON BORON-DOPED DIAMOND FILMS: ITS APPLICATION TO CONDUCTIVE PATTERN FORMING ON DIAMOND AND DIAMOND PHOTOGRAPHIC PHENOMENON
Yoshihara, S.;Shinozaki, K.;Shirakashi, T.;
Department of Energy and Environmental Science, Graduate School of Engineering, Utsunomiya University;
Photoelectrodeposition of copper on semiconductive B-doped diamond films was investigated. There are cleasr morphology differences between photodeposited copper and electrodeposited copper. Photoelecrodeposition proceeded as uniform 2-dimensional growth. On the other hand electrodeposition proceeded as scarce random deposition. By applying this effect we have succeeded in forming a conductive pattern on semiconductive B-doped diamond with the aid of a photo-mask. And it was suggested that the surface reforming caused by photoelectrochemical process could be easily detected by the following metal (copper) deosition method, which is demonstrated as 'Diamond photographic phenomenon'.
B-depoed diamond;copper;elecrodeposition;photoelectrodeposition;