한국표면공학회지 (31권3호 171-176)
Effects of Oxygen Partial Pressure on ITO Thin Films PrePared by Reactive dc Magenetron Sputtering
반응성 dc 미그네트론 스퍼링법으로 제조된 IPO박막에 미치는 산소분압의 영향
신성호;신재혁;박광자;김현우;
무기화학과, 국립기술품질원 , 경기도 과천시 427-010;전자과, 두원공과대학 경기도 안성시 456-890;
Transparent conducting ITO (Indium Tin Oxide) thin films were prepared on soda lime glass by reactive dc magnetron sputtering mothod. The maaterial properties were measured by the X-ray diffraction meter (XRD) and atomic force microscopy (AFM) scanning. As a resuIts, the (400) park for