한국표면공학회지 (30권4호 248-254)
Development of Sulfidation Resistant Amorphous Nb-Ni-Al-Si Coating Layer
내황화성 비정질 Nb-Ni-Al-Si 코팅층의 개발
이동복;김종성;백종현;
성균관대학교 금속공학과;한국가스공사 연구개발원;
The sulfidation behavior of a sputter-deposited amorphous coating of 69.0%Nb-16.9Ni-11.9%Al-2.2%Si (at.%) has been investigated as a funtion of temperature.(973-1173K) in pure sulfur pressure of 0.01atm. The sulfidation kinetics of the casting obyed the parabolic rate low over the whole temperature ranges studied. The stlfidation rate increased with the temperature, as expected. The sulfide scale, the composition of which was