Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


공학

한국표면공학회지 (29권6호 644-647)

IMPROVEMENT OF DISTRIBUTION OF COERCIVITY IN CO-CR FILMS DEPOSSSITED BY FACING TARGETS SPUTTERING


Takayama, Seiryu;Nakagawa, Shigeki;Kim, Kyung-Hwan;Naoe, Masahiko;


Dept. of Physical Electronics, Tokyo Institute of Technology;Dept. of Electrical Electronics, Kyung Won University;

Abstract

The distribution of coercivity in the thickness direction were investigated by using Kerr hysteresis loop tracer for the Co-Cr films deposited by Facing Targets Sputtering apparatus. It was found that the difference between the coercivities of surface layer and initial growth layer H$_c$$ot$(S)-H$_c$$ot$(I) correlated strongly with $Delta$H$_o$, shich represents the degree of distribution of coercivity. Furthermore, the Cr content was varied in order to improve the coercivity of imitial growth layer H$_c$$ot$(I) and distribution of coercivity. H$_c$$ot$(I) took a maximum value of 750 Oe and the distribution of coercivity became sharper at the Cr content of 25at. %.

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