한국표면공학회지 (29권6호 644-647)
IMPROVEMENT OF DISTRIBUTION OF COERCIVITY IN CO-CR FILMS DEPOSSSITED BY FACING TARGETS SPUTTERING
Takayama, Seiryu;Nakagawa, Shigeki;Kim, Kyung-Hwan;Naoe, Masahiko;
Dept. of Physical Electronics, Tokyo Institute of Technology;Dept. of Electrical Electronics, Kyung Won University;
The distribution of coercivity in the thickness direction were investigated by using Kerr hysteresis loop tracer for the Co-Cr films deposited by Facing Targets Sputtering apparatus. It was found that the difference between the coercivities of surface layer and initial growth layer H