Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403

공학

한국표면공학회지 (29권5호 330-337)

PROPOSE NEW MIXTURE TARGET FOR LOW-TEMPERATURE AND HIGH- RATE DEPOSITION OF PZT THIN FILMS BY REACTIVE SPUTTERING


Hata, Tomonobu;Zhang, WeiXiao;Sasaki, Kimihiro;


Department of Electrical and Computer Engineering, Faculty of Engineering, Kanazawa University;

Abstract

A rf reactive sputter deposition technique was adopted to deposit ferroelectric lead zirconate titanate (PZT) thin films with high rate from a ZrTi alloy target combined with PbO pellets. Deposition characterisitics including the effects of PbO are ratio were discussed. A new deposition mode called the quasi-metallic mode was observed. Perovskite PZT films were prepared at a growth temperature as low as$ 450^{circ}C$. However, because the target structure is unstable, weproposed a mixture target consisted of Zr, Ti and PbO. Fundamental experiments were investigated using the powder target. Perovskite PZT film could be obtained at $450^{circ}C$ with better electrical properties also.

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