Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


공학

한국표면공학회지 (26권4호 163-174)

Effect of Gelatine on the Electrodeposition of Copper

구리 전착에서 젤라틴의 영향

장영철;손헌준;

동서산업(주) 신소재 연구소;서울대학교 공과대학 자원공학과;

Abstract

The effect of gelatine on the electrodeposition of copper in cupric sulfate-sulfuric acid solution was investi-gated using an ac impedance technique. In the presence of gelatine, the charge transfer resistance was in-creased and the electrical double layer capacitance was decreased. A model was suggested to explain the im-pedance spectra and it fitted well the experimental data. Also the uniformity of deposit thickness was in-creased while the grain size was decreased by the addition of gelatine.

Keywords