한국표면공학회지 (22권3호 128-134)
Mechanism of Cobalt Deposition using Polarization Meaurements in Sulfate Solution
분극곡선에 의한 황산염 용액에서의 코발트 석출기구
백민선;김기호;강탁;손헌준;
Paik, M. S.;Kim, K. H.;Kang, T.;Sohn, H. J.;
서울대학교 공과대학 금속공학과;서울대학교 공과대학 자원공학과;
서울대학교 공과대학 금속공학과;서울대학교 공과대학 자원공학과;
Mechanism of cobalt deposition was investigated using the potentiodynamic potentiostatic methods in solution of pH 4 and pH6.4 In all experimental conditions, polarization curves showed two regions with different Tafel slopes and the reaction order of cobalt ion was varied with the pH. It is belived that the deposition mechanism depends not only on the portential but also on the ph.
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