Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


공학

한국표면공학회지 (22권1호 17-25)

Structural Characteristisrics and Adhesion of Chemicaly Vapor Deposited TiN Films on Stainless Steels

화학증착된 TiN 박막의 구조적 특성 및 결합력에 관한 연구

이민섭;이성래;백영현;

고려대학교 공과대학 금속공학과;

Abstract

The structural Charactesties and adhesion of chemically vapor deposited TiN film on stain less steels have been investated as functions of deposition temperature, surface roughness of sub state, and types of substrates. The grain zine and the lattice parameter of TiN film decreased with decreasing roughness of substates. The(200) preferred orientation was developed dominatly and the lattlice parameter decreased as temperature intereased reardless of the surdless roughnessand type of the substrates used. The surface morphology of TiN film changed from bushed crystal to a plate and then to pyamidal dense crystals with an increase in the deposition temperature. The adhesion of TiN films increased with coating thinkness and decreased with surface roughness in general. The calculations using a Bejamin & Weaver`s model have been compard. Maximum valuse of adhesion energy calculated using Laguier`s model were W304=331Jm-2,w410=113Jm-2,andW430=107jm-2

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