공학
한국표면공학회지 (18권3호 125-133)
Electrodeposition of Nickel from Nickel Sulphamate Baths
설파민산 니켈 도금욕에서의 니켈 전착
Lee, Hong-Ro;Lee, Dong-Nyung;
Dept. of Metallurgical Engineering, Chung Nam National Unvirsity;Dept. of Metallurgical Engineering, Seoul National Unvirsity;
Abstract
About 1 mm thick nickel electrodeposits were obtained from nickel sulphamate baths at 40 to 60$^{circ}C$ over the range of current densities form 5 to 25 A/$dm^2$. Deposits from above about 1.2V of cathode overpotential had randomly distributed fine grains due to a higher nucleation rate and hence had a high hardness. A deposit obtained at 0.63 V had the [110] orientation with a field oriented fine structure which yield a relatively high hardness. Deposite obtained at the intermediate overpotentials showed the [100] orientation with coarse field oriented structure whose column width tended to decrease with increasing cathode overpotential, which, in turn, gave rise to an increase in hardness. Residual stresses of the deposits measured by X-ray technique were mostly tensile but did not exceed 80 MPa, and were occasionally very small compressive. The cathode current efficiency was above 90% in all the electrolysis conditions, whereas the anode current efficiency varied from 50 to 90% with current density, bath temperature and nickel chloride concentration, among which the chloride was the most influential.
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