한국표면공학회지 (54권2호 53-61)
Optimization of tetrahedral amorphous carbon (ta-C) film deposited with filtered cathodic vacuum arc through Taguchi robust design
다구찌 강건 설계를 통한 자장 여과 아크 소스로 증착된 사면체 비정질 탄소막의 최적화
곽승윤 a,b , 장영준 b , 류호준 a,b , 김지수 c,d , 김종국 b*
Seung-Yun Kwak a,b , Young-Jun Jang b , Hojun Ryu a,b , Jisoo Kimc,d , and Jongkuk Kimb*
a부산대학교 기계공학부, b한국재료연구원 표면재료연구본부 극한환경코팅 연구실, c경북대학교 정밀기계 공학과, d경북대학교 미래과학기술융합학과
aDepartment of mechanical engineering, Pusan National University (PNU), Busan 46241, Korea b Extreme Environmental Coating Department, Korea Institute of Materials Science (KIMS), Changwon, 51508, Korea dDepartment of Advanced Science and Technology Convergence, Kyungpook National University (KNU), Sangju, 37224, Korea
The properties of tetrahedral amorphous Carbon (ta-C) film can be determined by multiple parameters and comprehensive effects of those parameters during a deposition process with filtered cathodic vacuum arc (FCVA). In this study, Taguchi method was adopted to design the optimized FCVA deposition process of ta-C for improving deposition efficiency and mechanical properties of the deposited ta-C thin film. The influence and contribution of variables, such as arc current, substrate bias voltage, frequency, and duty cycle, on the properties of ta-C were investigated in terms of deposition efficiency and mechanical properties. It was revealed that the deposition rate was linearly increased following the increasing arc current (around 10 nm/min @ 60 A and 17 nm/min @ 100A). The hardness and ID/IG showed a correlation with substrate bias voltage (over 30 GPa @ 50 V and under 30 GPa @ 250 V). The scratch tests were conducted to specify the effect of each parameter on the resistance to plastic deformation of films. The analysis on variances showed that the arc current and substrate bias voltage were the most effective controlling parameters influencing properties of ta-C films. The optimized parameters were extracted for the target applications in various industrial fields.
Filtered cathodic vacuum arc (FCVA); Taguchi robust design; Tetrahedral amorphous carbon (ta-C);Diamond like carbon (DLC)