저널

We investigated mechanochemical radical, which is concomitant with chemical lift-off lithography(CLL), on the self-assembled monolayer(SAM)/electrodes and a polydimethylsiloxane(PDMS) using a colorimetric and a spectroscopic method. The 11-mercaptoundecanol(MUO)/Au or the 11-hydroxyundecylphosphonic acid (HUPA)/ITO were contacted with bare or activated PDMS. After contact, the each of SAM/substrates and the PDMS were immersed in a 2,2 Diphenyl-1-picrylhydrazyl(DPPH) radical scavenger. The color of the DPPH exposed to the PDMS was changed from purple to yellow and the absorbance decreased definitely at 515 nm wavelength. The SAM/substrates, however, have caused small changes in spectroscopic property, indicating no existence of radical species. We concluded that mechanochemical radicals were formed by homolytic cleavage of PDMS molecules upon external force and hardly transferred on the SAM/substrates.

Chemical Lift-Off lithography(CLL);Mechanochemistry;Self-Assembled Monolayer(SAM);Radical;Bond Breaking;