Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


공학

한국표면공학회지 (53권3호 109-115)

Characteristics of a Polycrystalline Diamond Thin Film Deposited on a-plane Sapphire Substrate

a-plane 사파이어기판에 증착된 Polycrystalline Diamond 박막의 특성

싱얀탄;장태환;권진욱;김태규;
Tan, Xing Yan;Jang, Tae Hwan;Kwon, Jin Uk;Kim, Tae Gyu;

부산대학교 나노융합기술학과;부산대학교 나노메카트로닉스공학과;
Department of Nano Fusion Technology, Pusan National University;Department of Nanomechatronics Engineering, Pusan National University;

DOI : 10.5695/JKISE.2020.53.3.109

Abstract

In this study, polycrystalline diamond was synthesized by chemical vapor deposition (CVD). Diamond films were deposited on a-plane sapphire substrates while changing the concentration of methane for hydrogen (CH4/H2), and the concentrations of methane were 0.25, 0.5, 1, 2, 3 and 4 vol%, respectively. Crystallinity and nucleation density according to changes in methane concentration were investigated. At this time, the discharge power, vacuum pressure, and deposition time were kept constant. In order to deposit polycrystalline diamond, the sapphire substrate was etched with sulfuric acid and hydrogen peroxide (ratio 3:7), and the sapphire surface was polished for 30 minutes with 100 nm-sized nanodiamond particles. The deposited diamond thin film was analyzed by a scanning electron microscope (SEM), a Raman spectra, Atomic force microscope (AFM) and an X-ray diffractometer (XRD). By controlling the ratio of methane to hydrogen and performing appropriate pre-treatment conditions, a polycrystalline diamond thin film having excellent crystallinity and nucleation density was obtained.

Keywords

a-plane sapphire substrate;Polycrystalline Diamond;MPECVD;Raman spectra;XRD;AFM;