Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403

공학

한국표면공학회지 (53권3호 104-108)

Influence of Au Interlayer Thickness on the Opto-Electrical Properties of ZnO Thin Films

Au 층간박막 두께에 따른 ZnO 박막의 전기광학적 특성 변화

박윤제;최수현;김유성;차병철;공영민;김대일;
Park, Yun-Je;Choe, Su-Hyeon;Kim, Yu-Sung;Cha, Byung-Chul;Gong, Young-Min;Kim, Daeil;

울산대학교 첨단소재공학부;한국생산기술연구원 첨단정형공정그룹;
School of Materials Science and Engineering, University of Ulsan;Advanced Forming Processes R&D Group, Korea Institute of Industrial Technology;

DOI : 10.5695/JKISE.2020.53.3.104

Abstract

ZnO single layer films (100 nm thick) and Au intermediated ZnO films (ZnO/Au/ZnO; ZAZ) were deposited on the glass substrate by RF and DC magnetron sputtering at room temperature and then the influence of the Au interlayer on the electrical and optical properties of the films were investigated. ZnO thin films show the visible transmittance of 90.3 % and sheet resistance of 63.2×108 Ω/□. In ZAZ films, as Au interlayer thickness increased from 6 to 10 nm, the sheet resistance decreased from 58.3×108 to 48.6 Ω/□, and the visible transmittance decreased from 84.2 to 73.9 %. From the observed results, it can be concluded that the intermediate Au thin film enhances the opto-electrical performance of ZnO films without intentional substrate heating.

Keywords

ZnO;Au;Sheet resistance;Visible transmittance;Optical band gap;