Effect of ALD-Al2O3 Passivation Layer on the Corrosion Properties of CrAlSiN Coatings
ALD-Al2O3 보호층이 적용된 CrAlSiN 코팅막의 내부식성 특성에 관한 연구
만지흠;이우재;장경수;최현진;권세훈;
Wan, Zhixin;Lee, Woo-Jae;Jang, Kyung Su;Choi, Hyun-Jin;Kwon, Se Hun;
부산대학교, 재료공학부;(주)서영, 나노융합사업팀;부산테크노파크, 멤스나노부품생산센터;
School of Materials Science and Engineering, Pusan National University;Nano Convergence Team, Seo Yeong Co. Ltd.;MEMS/NANO Component Production Center, Busan Techno Park;
DOI : 10.5695/JKISE.2017.50.5.339
Highly corrosion resistance performance of CrAlSiN coatings were obtained by applying ultrathin $Al_2O_3$ thin films using atomic layer deposition (ALD) method. CrAlSiN coatings were prepared on Cr adhesion layer/SUS304 substrates by a hybrid coating system of arc ion plating and high power impulse magnetron sputtering (HiPIMS) method. And, ultrathin $Al_2O_3$ passivation layer was deposited on the CrAlSiN/Cr adhesion layer/SUS304 sample to protect CrAlSiN coatings by encapsulating the whole surface defects of coating using ALD. Here, the high-angle annular dark-field scanning transmission electron microscopy (HAADF-STEM) and energy dispersive X-ray spectrometry (EDX) analysis revealed that the ALD $Al_2O_3$ thin films uniformly covered the inner and outer surface of CrAlSiN coatings. Also, the potentiodynamic and potentiostatic polarization test revealed that the corrosion protection properties of CrAlSiN coatings/Cr/SUS304 sample was greatly improved by ALD encapsulation with 50 nm-thick $Al_2O_3$ thin films, which implies that ALD-$Al_2O_3$ passivation layer can be used as an effect barrier layer of corrosion.