Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403

공학

한국표면공학회지 (50권3호 192-197)

Development of UBMS(Unbalanced Magnetron Sputtering) System and Ion Current Density Measurement of Copper Target

UBM 마그네트론 스퍼터 시스템을 이용한 구리 타겟의 이온전류밀도 향상 연구

강충현;주정훈;
Kang, Chunghyeon;Joo, Junghoon;

군산대학교 공과대학 신소재공학과;
Department of Materials Science & Engineering, Kunsan National University;

DOI : 10.5695/JKISE.2017.50.3.192

Abstract

A 6-way-cross consisting of a 2.75-inch CF flange was used as a main chamber on a PFEIFFER VACUUM TMP station based on a 67 l / sec turbo molecular pump and a diaphragm pump to produce a magnet array with a volume ratio of 5.5: 1.A 1-inch diameter copper target and graphite target were fabricated using MDX-1.5K from Advanced Energy Industries, Inc as a DC power supply. Ion current density of copper target and graphite target was measured by unbalanced magnetron sputtering. The basic pressure condition was $6.3{ imes}10^{-7}mbar$ and the process pressure was Ar 50 sccm at $1.0{ imes}10^{-2}mbar$ (7.5 mTorr) in the Ar atmosphere. Therefore, the relative density of copper ions reaching the substrate with the measured ion current density was derived.

Keywords

UBMS(Unbalanced Magnetron Sputtering);Sputtering;Ion current density;