Deposition Characteristics of TiO2 Thin Films Prepared by DC Pulsed Magnetron Sputtering
DC 펄스 마그네트론 스퍼터링으로 증착된 TiO2 박막의 특성변화에 관한 연구
안은솔;허성보;김규식;정우창;박용호;박인욱;
An, Eunsol;Heo, Sung-Bo;Kim, Kyu-Sik;Jung, Uoo Chang;Park, Yong Ho;Park, In-Wook;
한국생산기술연구원;부산대학교 재료공학부;
Korea Institute of Industrial Technology (KITECH);School of Materials Science and Engineering, Pusan National University;
DOI : 10.5695/JKISE.2015.48.2.43
This study reports a fabrication of $TiO_2$ on the surface of dental implants by pulsed d.c. magnetron sputtering from a Ti target. A systematic investigation on the microstructure and mechanical properties of $TiO_2$ films was carried out with the variation of $O_2$ contents and substrate temperatures. The effects of deposition parameters on the fabricated structures were investigated by X-ray diffraction (XRD) technique and field emission scanning electron microscope (FE-SEM). Hydrophilic properties were evaluated by measuring water contact angles on the film surface. With increasing $O_2$ contents up to 40%, surface roughness of $TiO_2$ film increased while relatively smooth surface was obtained with 50% $O_2$ contents. Surface roughness and adhesion strength both increased as substrate temperature increased up to $200^{circ}C$. From these results, hydrophilic and adhesive properties of the present $TiO_2$ films synthesized with 40% $O_2$ at $200^{circ}C$ are regarded to be suitable for bio-compatible applications.
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