Design and Fabrication of Dual Tip Si3N4 Probe for Dip-pen Nanolithograpy
Dip-pen nanolithography를 위한 이중 팁을 가진 질화규소 프로브의 설계 및 제조
김경호;한윤수;
Kim, Kyung Ho;Han, Yoonsoo;
한국세라믹기술원 이천분원, 엔지니어링세라믹팀;
Engineering Ceramic Team, KICET Ichron Branch;
DOI : 10.5695/JKISE.2014.47.6.362
We report the design, fabrication of a $Si_3N_4$ probe and calculation of its mechanical properties for DPN(dip pen nanolithography), which consists of dual tips. Concept of dual tip probe is to employ individual tips on probe as either an AFM tip for imaging or a writing tip for nano patterning. For this, the dual tip probe is fabricated using low residual stress $Si_3N_4$ material with LPCVD deposition and MEMS fabrication process. On the basis of FEM analysis we show that the functionality of dual tip probe for imaging is dependent on the dimensions of dual tip probe, and high ratio of widths of beam areas is preferred to minimize curvature variation on probe.
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