Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403

공학

한국표면공학회지 (47권1호 53-56)

I-V Characteristics of Negatively DC Pulsed Target in ECR Plasma for Landmine Detection

지뢰탐지를 위한 ECR 플라즈마에서 타깃에 고전압 DC 펄스 인가시 전압-전류 특성 분석

김성봉;이희재;박승일;유석재;조무현;한승훈;임병옥;
Kim, Seong Bong;Lee, Hui Jea;Park, Seungil;Yoo, Suk Jae;Cho, Moohyun;Han, Seung-Hoon;Lim, Byeongok;

국가핵융합연구소 플라즈마기술연구센터;포항공과대학교 물리학과;삼성탈레스 ISR/PGM 연구소;
Plasma Technology Research Center;Department of Physics, Pohang University of Science and Technology;Samsung Thales;

DOI : 10.5695/JKISE.2014.47.1.053

Abstract

I-V characteristics of a cylindrical target in an ECR plasma were studied for sheath spatial evolutions when the target was pulsed biased to a high negative potential. The magnetic field effects on sheath thickness and sheath boundary speed were investigated by comparison between the experimental results and the theoretical results using the Child-Langmuir sheath model. The results showed that the magnetic field suppressed electron motion away from the target so that sheath thickness and sheath boundary speed decreased.

Keywords

ECR plasma;High voltage pulse;