한국표면공학회지 (46권5호 187-191)
Characteristics of NbN Films Deposited on AISI 304 Using Inductively Coupled Plasma Assisted DC Magnetron Sputtering Method
Jun, Shinhee;Kim, Junho;Kim, Sunkwang;You, Yong Zoo;Cha, Byungchul;
School of Materials Science and Engineering, University of Ulsan;Advanced Hybrid Production Technology Center, Korea Institute of Industrial Technology;
Niobium nitride (NbN) films were deposited on AISI 304 stainless steels by inductively coupled plasma (ICP) assisted dc magnetron sputtering method at different ICP powers, and the effects of ICP power on the phase formation, mechanical and chemical properties of the films were investigated. X-ray diffraction analysis (XRD) and field emission scanning electron microscopy (FESEM) were used to analyze the crystal structure and micro-knoop hardness was used to measure the hardness of the films. Also, 3-D mechanical profiler and a ball-on-disk wear tester were used to measure the thickness of the films and to estimate wear characteristics, respectively. The thickness of the films decreased but their hardness increased with increasing ICP power, and it was confirmed that only cubic
NbN thin films;Inductively coupled plasma (ICP);Reactive magnetron sputtering;