Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


공학

한국표면공학회지 (46권3호 133-138)

Characterization of Gas Distribution Effect in Inductively Coupled Plasma System

유도결합 플라즈마 시스템의 수치 모델링에서 가스 분배 특성 해석

주정훈;
Joo, Junghoon;

군산대학교 공과대학 신소재공학과;
Department of Materials Science and Engineering and Plasma Materials Research Center, Kunsan National University;

DOI : 10.5695/JKISE.2013.46.3.133

Abstract

We have developed a 2D axi-symmetric numerical model for an inductively coupled plasma system in order to analyze gas mixing effect through a narrow gap shower head. For frictional flow, holes of 0.5 mm diameter and 2 mm length are approximately modeled in 2D. Gas velocity distribution 10 mm below the shower head showed 2 times difference between the center and the edge at 10 mTorr. At 10 mm above the wafer, it was increased to 6 times difference due to the pumping duct effect. The model with a 5 mm height buffer region of a shower head showed reasonable behavior of Ar discharge. The density of Ar metastable showed additional peak inside the buffer region around the edge holes.

Keywords

Numerical modeling;Inductively coupled plasma;CFD-ACE;