Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


공학

한국표면공학회지 (45권4호 174-180)

Numerical Modeling of a Rectangular Type Inductively Coupled Plasma System

사각형 유도 결합 플라즈마 시스템의 수치 모델링

주정훈;
Joo, Jung-Hoon;

군산대학교 신소재공학과, 플라즈마 소재응용센터;
Department of Materials Science and Engineering & Plasma Materials Research Center, Kunsan National University;

DOI : 10.5695/JKISE.2012.45.4.174

Abstract

Low pressure inductively coupled plasma characteristics of argon and oxygen are numerically simulated for a 400 mm rectangular type system with a plasma fluid model. The results showed lower power absorption profile at the corner than a circular one in a 13.56 MHz driven 1.5 turn antenna system with a drift-diffusion and quasi-neutrality assumption. Ions controlled by electric field are more non-uniform than metastables and the power absorption profile of oxygen plasma is affected by horizontal gas flow pattern to show 25% lower power absorption at the pumping flange side. Oxygen negative ions which are generated in electron collisional dissociation of oxygen molecules was calculated as 0.1% of oxygen atoms with similar spatial profile.

Keywords

Inductively coupled plasma;Numerical modeling;Sputtering;Bipolar plate;