Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


공학

한국표면공학회지 (45권2호 81-88)

Characteristics of MEMS Probe Tip with Multi-Rhodium Layer

이중 로듐 층을 갖는 멤스 프로브 팁의 특성

박동건;박용준;임슬기;김일;신상훈;조현철;박승필;김동원;
Park, Dong-Gun;Park, Yong-Joon;Lim, Seul-Ki;Kim, Il;Shin, Sang-Hun;Cho, Hyun-Chul;Park, Seung-Pil;Kim, Dong-Won;

경기대학교 신소재공학과;(주)윌테크놀러지;
Department of Advanced Materials Engineering, Kyonggi University;Will Technology;

DOI : 10.5695/JKISE.2012.45.2.081

Abstract

Probe tip, which should have not only superior electrical characteristics but also good abrasion resistance for numerous contacts with semiconductor pads to confirm their availability, is essential for MEMS probe card. To obtain good durability of probe tip, it needs thick and crack-free rhodium layer on the tip. However, when the rhodium thickness deposited by electroplating increased, unwanted cracks by high internal stress led to serious problem of MEMS probe tip. This article reported the method of thick Rh deposition with Au buffer layer on the probe tip to overcome the problem of high internal stress and studied mechanical and electrical properties of that. MEMS probe tip with double-Rh layer had good contact resistance and durability during long term touch downs.

Keywords

MEMS probe card;MEMS probe tip;Electroplating;Rhodium;Buffer layer;