Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403

공학

한국표면공학회지 (44권6호 260-263)

Effect of ITO Layer on Electrical and Optical Properties of GZO/ITO Double-layered TCO Films Deposited by RF Magnetron Sputtering for Application to Solar Cells

RF 마그네트론 스퍼터링법으로 증착한 태양전지용 GZO/ITO 투명전도성 박막의 물성에 미치는 ITO층의 영향

정아로미;송풍근;
Chung, Ah-Ro-Mi;Song, Pung-Keun;

부산대학교 재료공학부;
Department of Materials Science and Engineering, Pusan National University;

DOI : 10.5695/JKISE.2011.44.6.260

Abstract

GZO/ITO double layered films were deposited on unheated non-alkali glass substrates by RF magnetron sputtering using an ITO ($SnO_2$: 10 wt%) and GZO($Ga_2O_3$: 5.57 wt%) ceramic targets, respectively. The electrical resistivity of GZO/ITO films depends on the thickness ratio between the GZO film and ITO film. With increasing ITO film thickness, the resistivity of GZO/ITO films decreased which due to large increase in the Hall mobility. Also, the crystallinity of GZO/ITO film was improved with an increase in ITO thickness which was evaluated by X-ray diffraction. The average transmittance of the films was more than 85% in the visible region, which is slightly higher than ITO single layer films.

Keywords

ITO;GZO;Magnetron sputtering;Double layer;Solar cells;