Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403

공학

한국표면공학회지 (44권3호 95-104)

Microstructure and Wear Resistance of Ti-Me-N (Me=V, Nb and Si) Nanofilms Prepared by Hybrid PVD

Hybrid PVD로 제조된 Ti-Me-N (Me=V, Si 및 Nb) 나노 박막의 미세구조와 마모특성

양영환;곽길호;이성민;김성원;김형태;김경자;임대순;오윤석;
Yang, Young-Hwan;Kwak, Kil-Ho;Lee, Sung-Min;Kim, Seong-Won;Kim, Hyung-Tae;Kim, Kyung-Ja;Lim, Dae-Soon;Oh, Yoon-Suk;

한국세라믹기술원 이천분원 엔지니어링세라믹센터;고려대학교 신소재공학과;
Department of Engineering Ceramic Center, KICET;Department of Materials Science and Engineering, Korea University;

DOI : 10.5695/JKISE.2011.44.3.095

Abstract

Ti based nanocomposite films including V, Si and Nb (Ti-Me-N, Me=V, Si and Nb) were fabricated by hybrid physical vapor deposition (PVD) method consisting of unbalanced magnetron (UBM) sputtering and arc ion plating (AIP). The pure Ti target was used for arc ion plating and other metal targets (V, Si and Nb) were used for sputtering process at a gas mixture of Ar/$N_2$ atmosphere. Mostly all of the films were grown with textured TiN (111) plane except the Si doped Ti-Si-N film which has strong (200) peak. The microhardness of each film was measured using the nanoindentation method. The minimum value of removal rate ($0.5{ imes}10^{-15};m^2/N$) was found at Nb doped Ti-Nb-N film which was composed of Ti-N and Nb-N nanoparticles with small amount of amorphous phases.

Keywords

Tribology;Ti-V-N;Ti-Nb-N;Ti-Si-N;Hybrid PVD;Nanocomposite film;