Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


공학

한국표면공학회지 (44권2호 50-54)

Deposition of Super Hydrophobic a-C:F Films by Dielectric Barrier Discharge at Atmospheric Pressure


Kim, Duk-Jae;Kim, Yoon-Kee;Han, Jeon-Geon;


Geniatech Inc.;Department of Welding and Production Engineering, Hanbat National University;Department of Advanced Materials Science & Engineering, Sungkyunkwan University;

DOI : 10.5695/JKISE.2011.44.2.050

Abstract

Hydrophobic a-C:F film was coated on polycarbonate film with $CF_4$, $C_2F_6$ and HFC ($C_2F_4H_2$) gas in helium discharge generated by 5~100 kHz AC power supply at atmospheric pressure and room temperature. The highest water contact angle of the a-C:F film formed with $He/C_2F_6$ mixed gas is $155^{circ}$. X-ray photoelectron spectrum showed that there was 40% of C-$CF_3$ bond at the surface of the super hydrophobic film. The contact angle and deposition rate were decreased with increasing substrate temperature. The contact angle was generally increased with the surface roughness of the film. The contact angle was high when the surface microstructure of the film was fine and sharp at the similar roughness and chemical composition of the surface.

Keywords

Hydrophobic coatings;Fluorinated coating;Dielectric barrier discharges (DBD);Atmospheric pressure glow discharges (APGD);