한국표면공학회지 (43권5호 217-223)
Formation and Chemical Dissolution Behaviors of Nano Porous Alumina
나노 기공성 알루미나의 생성과 화학적 용해 거동
오한준;정용수;지충수;
Oh, Han-Jun;Jeong, Yong-Soo;Chi, Choong-Soo;
한서대학교 신소재공학과;한국재료연구소 융합공정연구본부;국민대학교 신소재공학부;
Department of Materials Science, Hanseo University;Materials Processing Division, Korea Institute of Materials Science;School of Advanced Materials Engineering, Kookmin University;
For an application as templates of high performance with proper pore size and shape, porous anodic alumina films were prepared by anodization in oxalic acid, and formation behaviors of anodic alumina layer as well as dissolution process in acid solution have been investigated. The surface characteristics on anodic alumina layer were shown to be dependent on the fabrication parameters for anodization. For the dissolution behaviors of anodic alumina, the thickness of the barrier-type alumina layer decreased linearly with the rate of 0.98 nm/min in
Porous anodic alumina layer;Anodization;Barrier-type alumina;