Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403

공학

한국표면공학회지 (41권6호 331-334)

Fabrication of High Ordered Nano-sphere Array on Curved Substrate by Nanoimprint Lithography

나노임프린트 리소그래피를 이용한 곡면 기판 위에 정렬된 나노 볼 패턴 형성에 관한 연구

홍성훈;배병주;곽신웅;이헌;
Hong, S.H.;Bae, B.J.;Kwak, S.U.;Lee, H.;

고려대학교 신소재공학과;코닉시스템(주);
Department of Materials Science and Engineering, Korea University;RND center, Kornic System Co.;

DOI : 10.5695/JKISE.2008.41.6.331

Abstract

The replica of highly ordered nano-sphere array patterns were fabricated using hot embossing method. First, silica nano-sphere array on Si substrate was transferred to PVC film at $130^{circ}C$ and 7 bar using hot embossing process. Then, silica nano-sphere array on PVC template was removed by soaking the PVC film in buffered oxide etcher. In order to form anti-stiction layer, the PVC template was coated with silicon dioxide layer and self-assembled monolayer. Through UV nanoimprint lithography with the fabricated flexible PVC template, highly ordered nano-sphere array pattern was imprinted on curved substrates with high fidelity.

Keywords

Nano-sphere;Flexible template;UV nanoimprint lithography;Curved substrate;