Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


공학

한국표면공학회지 (41권4호 134-141)

Characterization of a Remote Inductively Coupled Plasma System

원격 유도결합 플라즈마 시스템의 특성 해석

김영욱;양원균;주정훈;
Kim, Yeong-Uk;Yang, Won-Kyun;Joo, Jung-Hoon;

군산대학교 신소재.나노화학공학부 신소재공학;
Department of Materials Science and Engineering and Plasma Materials Research Center, Kunsan National University;

DOI : 10.5695/JKISE.2008.41.4.134

Abstract

We have developed a numerical model for a remote ICP(inductively coupled plasma) system in 2D and 3D with gas distribution configurations and confirmed it by plasma diagnostics. The ICP source has a Cu tube antenna wound along a quartz tube driven by a variable frequency rf power source($1.9{sim}3.2$ MHz) for fast tuning without resort to motor driven variable capacitors. We investigated what conditions should be met to make the plasma remotely localized within the quartz tube region without charged particles` diffusing down to a substrate which is 300 mm below the source, using the numerical model. OES(optical emission spectroscopy), Langmuir probe measurements, and thermocouple measurement were used to verify it. To maintain ion current density at the substrate less than 0.1 $mA/cm^2$, two requirements were found to be necessary; higher gas pressure than 100 mTorr and smaller rf power than 1 kW for Ar.

Keywords

Numerical modeling;Inductively coupled plasma;CFD-ACE;