Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403

공학

한국표면공학회지 (40권3호 113-116)

Structure and Photo-catalytic Activity of TiO2 Films Deposited by Reactive RF Magnetron Sputtering

반응성 RF 마그네트론 스퍼터링법을 이용하여 MgO 기판위에 증착한 TiO2 박막의 구조와 광촉매 특성

이정철;송풍근;
Lee, Jung-Chul;Song, Pung-Keun;

부산대학교 재료공학부;
School of Materials Science and Engineering, Pusan National University;

DOI : 10.5695/JKISE.2007.40.3.113

Abstract

Titanium dioxide ($TiO_2$) films were deposited by RF reactive magnetron sputtering on non-alkali glass and single crystal MgO (100) substrate at substrate temperature of $400^{circ}C$. Micro structures of $TiO_2$ films were investigated by XRD, FE-SEM, and Pole figure measurements. $TiO_2$ films deposited on glass substrate showed preferred orientation of anatase (101), whereas $TiO_2$ films deposited on the MgO single crystal substrate showed hetero-epitaxial anatase (100). $TiO_2$ film grown on MgO substrate showed higher photoctalytic activity than that of glass substrate.

Keywords

Titanium dioxide;Photocatalyst;Crystallinity;Reactive sputtering;