Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403


공학

한국표면공학회지 (40권2호 59-62)

Microstructure and Physical Properties of Sputtered Metal Containing Nanocrystalline Structured Carbon Coatings


Kim, Sung-I.;Han, Jeon-G.;


Center for Advanced Plasma Surface Technology, SungKyunKwan University;

DOI : 10.5695/JKISE.2007.40.2.059

Abstract

Metal containing hydrogen free nanocrystalline structured carbon (Me:nc-C) films were synthesized by closed-field unbalanced magnetron sputtering system (CFUBM). The aim of this study was to determine the relationship between the microstructure and physical properties of Me:nc-C films as a function of the concentration of materials. The film structures were examined by x-ray photoelectron spectroscopy and high resolution transmission electron microscopy. The physical properties of the Me:nc-C films were evaluated by using a 4-point probe. The fraction of graphite clusters was found to be increased by containing titanium and the electrical resistivity decreased with increasing amount of containing.

Keywords

Metal containing nanocrystalline structured carbon;Me:nc-C;