Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403

공학

한국표면공학회지 (39권5호 199-205)

Processing and Characterization of RF Magnetron Sputtered TiN Films on AISI 420 Stainless Steel

AISI 420 stainless steel 기판위에 D.C magnetron sputtering 법으로 제조한 TiN 박막의 특성 평가

송승우;최한철;김영만;
Song, Seung-Woo;Choe, Han-Cheol;Kim, Young-Man;

전남대학교 공과대학 금속공학과;조선대학교 치과대학 치의학과;
Department of Materials Science and Engineering, Chonnam National University;Department of Dental Materials, Chosun University;

Abstract

Titanium nitride (TiN) coatings were produced on AISI 420 stainless steel by DC magnetron sputtering of a Ti target changing the processing variables, such as the flow rate of $N_2/Ar$, substrate temperature and the existence of Ti interlayer between TiN coatings and substrates. The hardness and residual stress in the films were investigated using nanoindentation and a laser scanning device, respectively. The stoichiometry and surface morphology were investigated using X-Ray Diffraction and SEM. The corrosion property of the films was also studied using a polarization method in NaCl (0.9%) solution. Mechanical properties including hardness and residual stress were related to the ratio of $N_2/Ar$ flow rate. The corrosion resistance also was related to the processing variables.

Keywords

Stoichiometry;Sputtering;Thin film;