Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403

공학

한국표면공학회지 (39권3호 98-104)

Deposition of Al Doped ZnO Films Using ICP-assisted Sputtering on the Plastic Substrate

유도결합 플라즈마 스퍼터링을 이용한 플라스틱 기판 상의 Al이 도핑된 ZnO 박막 증착

정승재;한영훈;이정중;
Jung, Seung-Jae;Han, Young-Hun;Lee, Jung-Joong;

서울대학교 재료공학부;
School of Materials Science and Engineering, Seoul National University;

Abstract

Al-doped ZnO (AZO) films were deposited on the plastic substrate by inductively coupled plasma (ICP) assisted DC magnetron sputtering. The AZO films were produced by sputtering a metallic target (Zn/Al) in a mixture of argon and oxygen gases. AZO films with an electrical resistivity of ${sim}10^3;{Omega}cm$ and an optical transmittance of 80% were obtained even at a low deposition temperature. In-situ process control methods were used to obtain stable deposition conditions in the transition region without any hysteresis effect. The target voltage was controlled either at a constant DC power. It was found that the ratio of the zinc to oxygen emission intensity, I (O 777)/I (Zn 481) decreased with increasing the target voltage in the transition region. The $Ar/O_2$ plasma treatment improve the adhesion strength between the polycarbonate substrate and AZO films.

Keywords

Al-doped ZnO (AZO);Inductively coupled plasma (ICP);Reactive sputtering;Target voltage control;Plastic substrate;