Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403

공학

한국표면공학회지 (38권5호 179-182)

Structure and Properties of Indium Tin Oxide Thin Films Sputtered from Different Target Densities


Kim Kyoo Ho;Jung Young Hee;Munir Badrul;Wibowo Rachmat Adhi;


Yeungnam University, School of Materials Science and Engineering;LG Electronics Ins, Development Group, OLED Division;

Abstract

Indium Tin Oxide (ITO) thin films were deposited from various target densities ($98.7\%~99.6\%$) using RF magnetron sputtering. Effect of the sputtering target densities on the structural, electrical and optical properties of deposited ITO thin films was investigated. The preferable (400) crystalline orientation peak was observed on the films deposited from > $99.0\%$ target density. Higher target density produced films with higher roughness but lower resistivity. All of the deposited films showed optical transmittance more than $85\%$ in the visible wavelength region. It is necessary to use the highest target density for sputtering deposition of ITO thin films.

Keywords

ITO thin films;Transparent semiconductor;Sputtering;Target density;Characterization;