Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403

공학

한국표면공학회지 (38권4호 144-149)

The Residual Stress Effect on Microstructure and Optical Property of ZnO Films Produced by RF Sputtering

R.F Sputtering으로 제조한 ZnO박막의 미세구조와 광학적 특성에 미치는 잔류응력의 영향

류상;김영만;
Ryu, Sang;Kim, Young-Man;

전남대학교 공과대학 금속공학과;
Department of Materials Science and Engineering , Mechanical Metallurgy Laboratory, Chonnam National University;

Abstract

ZnO films were produced on the Si(100) and sapphire(0001) wafers by RF magnetron sputtering in terms of processing variables such as substrate temperature and RF power. The stress in films was obtained from the Stoney`s formula using a laser scanning device. The stress levels in the films showed the range from $~40$ MPa to $~-1100$MPa depending on processing variables. The specimens were thermally cycled from R.T. to $250^{circ}C$ to investigate the stress variation as a function of temperature. SEM was employed to characterize the microstructure of te films. As the substrate temperature increased, the film surface became rougher and the films showed coarser grains. The optical property o the films was studied by PL measurements. At the highest substrate temperature $800^{circ}C$ the film exhibited sharper UV peaks unlike other conditions.

Keywords

Stress;ZnO thin films;R.F. magnetron sputtering;