Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403

공학

한국표면공학회지 (38권2호 69-72)

Influence of Deposition Pressure on Optical and Electrical Properties of ITO/Al/ITO Thin Films on PET by RF Magnetron Sputtering

RF magnetron sputter에 의한 PET기판상 ITO/Al/ITO 박막의 증착 압력이 광학적 전기적 특성에 미치는 영향

서정은;김상호;이인선;김동원;
Seo Jung-Eun;Kim Sang-Ho;Lee In-Seon;Kim Dong-Won;

한국기술교육대학교 신소재공학과;경기대학교 신소재공학과;
Korea University of Technology and Education, Advanced Materials Engineerin;Kyonggi University;

Abstract

ITO-Al-ITO multi-layers were deposited at room temperature by RF magnetron sputtering on polyethylene terephthalate (PET). The films were deposited at various pressures of $8 imes10^{-4},;1 imes10^{-3},;4 imes10^{-3},;8 imes10^{-3};and;1 imes10^{-2}$ Torr. A correlation between microstructure and electro-optical properties was studied. Films deposited? at low pressure have higher transmission, and lower reflectance and resistance than film deposited at high pressure. Sheet resistance, transmission, and reflectance were $141.6Omega/Box;88\%;and;6.8\%$ resectively when the deposition pressure was $8 imes10^{-4}$ torr, that was the optimum condition.

Keywords

ITO;Al;PET;RF magnetron sputtering;Optical transmission;Sheet resistance;