Korean Institute of Surface Engineering

pISSN : 1225-8024 | eISSN : 3399-8403

공학

한국표면공학회지 (38권2호 55-59)

Optical and Electrical Properties of ITO/Ni/ITO Thin Films

ITO/Ni/ITO 박막의 광학적 전기적 특성 연구

김소라;서정은;김상호;이인선;김동원;
Kim So-Ra;Seo Jung-Eun;Kim Sang-Ho;Lee In-Seon;Kim Dong-Won;

한국기술교육대학교 신소재공학과;경기대학교 신소재공학과;
Korea University of Technology and Education, Advanced Materials Engineering;Kyonggi University;

Abstract

ITO/Ni/ITO thin films were deposited on the PET by RF magnetron sputtering. Dependance of the process parameters such as deposition pressure, positions of Ni layer, on the transmittance, reflectance and sheet resistance of ITO/Ni/ITO film were investigated. When the Ni layer is placed at the center of ITO and deposition pressure is low, ITO/Ni/ITO films showed better optical and electrical properties. At these conditions, the transmittance, reflectance and sheet resistance of the ITO film were $90\%,;0.38\%$ and $185Omega/Box$ respectively.

Keywords

indium Tin Oxide[ITO];RF Sputtering;Ni;Transmittance;Sheet resistance;